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Comparison of the stress between rapid thermal annealed and excimer laser annealed polycrystalline silicon thin films Lee, CW; Ko, MK; Woo, SL; Oh, HW; Gho, SJ; Lee, JeongYong, SOLID STATE COMMUNICATIONS, v.105, no.12, pp.777 - 781, 1998-03 |
Crystallization of amorphous silicon thin films using a viscous nickel solution Ahn, JH; Ahn, Byung Tae, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.148, no.9, pp.115 - 119, 2001-09 |
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