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PERFORMANCE OF THE PLASMA-DEPOSITED TUNGSTEN NITRIDE BARRIER TO PREVENT THE INTERDIFFUSION OF AL AND SI LEE, CW; KIM, YT; LEE, C; Lee, JeongYong; MIN, SK; PARK, YW, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.12, no.1, pp.69 - 72, 1994-01 |
STRUCTURAL, ELECTRICAL AND OPTICAL-PROPERTIES OF SI DELTA-DOPED AL0.27GA0.73AS/GAAS SINGLE QUANTUM-WELLS GROWN BY METALORGANIC CHEMICAL-VAPOR-DEPOSITION KIM, TW; KIM, Y; MIN, SK; Lee, JeongYong; LEE, SJ, SEMICONDUCTOR SCIENCE AND TECHNOLOGY, v.9, no.10, pp.1823 - 1826, 1994-10 |
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