| 12321 | Reaction-Based Processing Methods for Ceramics and Composites ; Ceramic-Matrix Composites Fabricated by the Lanxide Process 김도경; 이성, 세라미스트, v.6, no.3, pp.182 - 189, 1991-03 |
| 12322 | Reaction-sintered LAGP solid electrolytes with MoS2 coating for improved stability with Li metal Baek, Seung Jin; Cha, Eunho; Kim, Dong Gyu; Yun, Jong Hyuk; Kim, Do Kyung, CERAMICS INTERNATIONAL, v.48, no.23, pp.34828 - 34836, 2022-12 |
| 12323 | REACTIVE HOT PRESSING AND OXIDATION BEHAVIOR OF Hf-BASED ULTRA-HIGH-TEMPERATURE CERAMICS Lee, Seung-Jun; Kang, Eul-Son; Baek, Seung-Su; Kim, Do-Kyung, SURFACE REVIEW AND LETTERS, v.17, no.2, pp.215 - 221, 2010-04 |
| 12324 | Reactive ion etching mechanism of copper film in chlorine-based electron cyclotron resonance plasma Lee, SK; Chun , Soung Soon; Hwang, CY; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.36, no.1A, pp.50 - 55, 1997-01 |
| 12325 | REACTIVE ION ETCHING MECHANISM OF PLASMA-ENHANCED CHEMICALLY VAPOR-DEPOSITED ALUMINUM-OXIDE FILM IN CF4/O-2 PLASMA KIM, JW; KIM, YC; Lee, Won-Jong, JOURNAL OF APPLIED PHYSICS, v.78, no.3, pp.2045 - 2049, 1995-08 |
| 12326 | Reactive ion etching mechanism of RuO2 thin films in oxygen plasma with the addition of CF4, Cl-2, and N-2 Lee, EJ; Kim, JW; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.37, no.5A, pp.2634 - 2641, 1998-05 |
| 12327 | Reactive magnetron sputter ion plating법에 의해 증착된 TiN 박막의 특성에 관한 연구 = A study on characteristics of the TiN thin films deposited by reactive magnetron sputter ion plating.link 강희수; Kang, Hee-Soo; et al, 한국과학기술원, 1996 |
| 12328 | Reactive magnetron sputter ion plating법으로 증착된 TiN 박막의 증착 특성 및 침식 특성에 관한 연구 = Deposition characteristics and liquid impingement erosion properties of TiN film fabricated by reactive magnetron sputter ion platinglink 이민구; Lee, Min-Ku; et al, 한국과학기술원, 1998 |
| 12329 | Reactive multi-target sputtering 법으로 증착된 P(L)ZT 박막의 제조 특성및 기억소자로의 응용에 관한 연구 = Deposition characteristics of P(L)ZT ferroelectric film fabricated by reactive multi-target sputtering method and its applications for memory deviceslink 김현호; Kim, Hyun-Ho; et al, 한국과학기술원, 1999 |
| 12330 | Reactive polymer based near-infrared fluorescent nanoparticles for bioimaging Wang, Wenxuan; 이지연; 길지효; 홍지현; Kharbash, Raisa; 남윤성; 리섕, 2023 한국고분자학회 추계학술대회, 한국고분자학회, 2023-10-11 |
| 12331 | Reactive processing and mechanical properties of ZrO2/NiAl intermetallic matrix composite Ryu, HC; Shim, MK; Hong, Soon-Hyung, JOURNAL OF MATERIALS PROCESSING TECHNOLOGY, v.63, no.1-3, pp.411 - 416, 1997-01 |
| 12332 | Reactive RF sputtering 법으로 제조한 ALN박막의 성장기구에 관한 연구 = A study on the growth mechanism of ALN thin films by reactive RF sputteringlink 이환철; Lee, Hwan-Chul; et al, 한국과학기술원, 1994 |
| 12333 | Reactive sputtering 에 의해 제조된 PZT 박막의 Imprint 특성 Ho-Gi Kim, 한국요업학회, 1996-01-01 |
| 12334 | Reactive sputtering법에 의한 $Pb(Zr,Ti)O_3$ 박막의 제조 및 특성평가에 관한 연구 = A study on the preparations and characterizations of $Pb(Zr,Ti)O_3$ thin films by reactive sputteringlink 조능호; Cho, Neung-Ho; et al, 한국과학기술원, 1995 |
| 12335 | Reactive Sputtering법으로 증착된 Pb(Zr,Ti)O3 박막의 전기적 성질에 관한 연구 Ho-Gi Kim, 한국재료학회, 1994-01-01 |
| 12336 | Reactive sputtering에 의해 제조된 PZT박막에 Ta-doping이 미치는 영향 Ho-Gi Kim, 한국요업학회(봄), 1996-01-01 |
| 12337 | Reactive Sputting으로 제조된 SrBi2Ta2O9박막의 전기적 특성에 미티는 저성의 영향 김호기, 한국재료학회지, v.6, no.9, pp.931 - 936, 1996-01 |
| 12338 | Reactive Structural Motifs of Au Nanoclusters for Oxygen Activation and Subsequent CO Oxidation An, Hyesung; Kwon, Soonho; Ha, Hyunwoo; Kim, Hyun You; Lee, Hyuck-Mo, JOURNAL OF PHYSICAL CHEMISTRY C, v.120, no.17, pp.9292 - 9298, 2016-05 |
| 12339 | Reactor corrosion in ceria production by hydrothermal synthesis under supercritical conditions Rao, VS; Kwon, Hyuk-Sang, CORROSION, v.63, pp.359 - 365, 2007-04 |
| 12340 | Read/write mechanisms and data storage system using atomic force microscopy and MEMS technology Shin, H; Hong, S; Moon, J; Jeon, JU, ULTRAMICROSCOPY, v.91, no.1-4, pp.103 - 110, 2002-05 |
