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Micron and submicron patterning of polydimethylsiloxane resists on electronic materials by decal transfer lithography and reactive ion-beam etching: Application to the fabrication of high-mobility, thin-film transistors Ahn, Heejoon; Lee, Keon Jae; Childs, William R.; Rogers, John A.; Nuzzo, Ralph G.; Shim, Anne, JOURNAL OF APPLIED PHYSICS, v.100, no.8, 2006-10 |
Micron and submicron patterning of polydimethylsiloxane resists on electronic materials by decal transfer lithography and reactive ion-beam etching: Application to the fabrication of high-mobility, thin-film transistors Ahn, Heejoon; Lee, Keon Jae; Childs, William R.; Rogers, John A.; Nuzzo, Ralph G.; Shim, Anne, Journal of Applied Physics, Vol.100, 2006 |
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