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Block copolymer multiple patterning integrated with conventional ArF lithography Park, Seung-Hak; Shin, Dong-Ok; Kim, Bong-Hoon; Yoon, Dong-Ki; Kim, Kyoung-Seon; Lee, Si-Yong; Oh, Seok-Hwan; et al, SOFT MATTER, v.6, no.1, pp.120 - 125, 2010 |
Hierarchical self-assembly of block copolymers for lithography-free nanopatterning Kim, Bong-Hoon; Shin, Dong-Ok; Jeong, Seong-Jun; Koo, Chong-Min; Jeon, Sang-Chul; Hwang, Wook-Jung; Lee, Su-Mi; et al, ADVANCED MATERIALS, v.20, no.12, pp.2303 - 2303, 2008-06 |
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