A self-assembled monolayer(SAM) is an organized layer in which the head group shows specific and reversible affinity for a substrate. This patterning has been engineered in a variety of ways, for example, by the selective removal, by the selective placement, by the selective reaction, by their destruction with energetic beam, or by their intentional removal with scanning probe tips moving. Thus, SAMs have been used as sacrificial structures to create patterns into metal and nanoparticles, cells, proteins, or other biomolecules can be patterned for the creation of high-ordered structures and architectures. But previous patterning method has several weaknesses such as low resolution, small area, slow and serial processes. Our method is suitable method to overcome above problems and attain fundamentally sub-10nm scale that is a challenge of conventional techniques.