The Nobel Nano-patterning Technology for High Resolution Pattern(sub 20nm) by Secondary Sputtering Phenomenon over Large Area

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The development of large-area nano-patterning with high resolution, high aspect ratio and simple process scheme/cost is a challenging work for realizing their potential applications in opto-electronics and nano-biotechnology1,2. Several approaches towards nanostructure fabrication have been exploited without resorting to expensive tools such as those used in deep-UV projection lithography and electron-beam lithography3. Here, we demonstrate a novel patterning technology enabling to fabricate the high resolution of complex nanoscale patterns with simple process. We discuss that various polycrystalline layers can be fabricated with in normal degree as ion-bombardment condition.
Issue Date
2010-11
Language
ENG
Citation

2010 MRS Fall Meeting

URI
http://hdl.handle.net/10203/171467
Appears in Collection
CBE-Conference Papers(학술회의논문)
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