The fabrication of complex patterns with high resolution and high aspect ratio pver large area by repetitive secondary sputtering lithography

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dc.contributor.author전환진-
dc.contributor.author정현수-
dc.contributor.author김종선-
dc.contributor.author정희태-
dc.date.accessioned2013-03-29T11:05:05Z-
dc.date.available2013-03-29T11:05:05Z-
dc.date.created2012-07-06-
dc.date.issued2012-04-26-
dc.identifier.citation2012 봄 총회 및 학술대회 한국화학공학회, v., no., pp. --
dc.identifier.urihttp://hdl.handle.net/10203/170281-
dc.languageKOR-
dc.publisher한국화학공학회-
dc.titleThe fabrication of complex patterns with high resolution and high aspect ratio pver large area by repetitive secondary sputtering lithography-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.publicationname2012 봄 총회 및 학술대회 한국화학공학회-
dc.identifier.conferencecountrySouth Korea-
dc.identifier.conferencecountrySouth Korea-
dc.contributor.localauthor정희태-
dc.contributor.nonIdAuthor전환진-
dc.contributor.nonIdAuthor정현수-
dc.contributor.nonIdAuthor김종선-
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CBE-Conference Papers(학술회의논문)
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