Graphene Field Effect Transistors with Ultrathin Fluoropolymer/SiO2 Hybrid Gate Dielectric
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Shin, Woo Cheol | - |
| dc.contributor.author | Cho, Byung Jin | - |
| dc.date.accessioned | 2013-03-29T10:27:58Z | - |
| dc.date.available | 2013-03-29T10:27:58Z | - |
| dc.date.created | 2012-07-05 | - |
| dc.date.issued | 2011-08 | - |
| dc.identifier.citation | The 9th International Nanotech Symposium & Exhibition with NANO KOREA 2011, v., no., pp. - | - |
| dc.identifier.uri | http://hdl.handle.net/10203/170064 | - |
| dc.language | ENG | - |
| dc.title | Graphene Field Effect Transistors with Ultrathin Fluoropolymer/SiO2 Hybrid Gate Dielectric | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | The 9th International Nanotech Symposium & Exhibition with NANO KOREA 2011 | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.contributor.localauthor | Cho, Byung Jin | - |
| dc.contributor.nonIdAuthor | Shin, Woo Cheol | - |
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