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Application of aberration-corrected TEM and image simulation to nanoelectronics and nanotechnology Korgel, BA; Lee, DohChang; Hanrath, T; Yacaman, MJ; Thesen, A; Matijevic, M; Kilaas, R; et al, IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, v.19, no.4, pp.391 - 396, 2006-11 |
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