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Conformal 3D Nanopatterning by Block Copolymer Lithography with Vapor-Phase Deposited Neutral Adlayer Yang, Geon Gug; Choi, Junhwan; Cha, Seung Keun; Lee, Gil Yong; Jin, Hyeong Min; Hwang, Ho Seong; Yun, Taeyeong; et al, ACS NANO, v.13, no.11, pp.13092 - 13099, 2019-10 |
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