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Application of aberration-corrected TEM and image simulation to nanoelectronics and nanotechnology Korgel, BA; Lee, DohChang; Hanrath, T; Yacaman, MJ; Thesen, A; Matijevic, M; Kilaas, R; et al, IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, v.19, no.4, pp.391 - 396, 2006-11 |
Effect of UV-O-2, NF3/H-2 surface preparation on the crystalline defects in silicon homoepitaxy (Part I. A study on photochemical surface preparation in series) Sun, MC; Kim, DoHyun; Kwon, SK, JOURNAL OF CRYSTAL GROWTH, v.237, no.2, pp.1399 - 1403, 2002-04 |
Round pinholes in indium-tin-oxide thin films on the glass substrates: a Taguchi method analysis and theoretical approach to their origins Lee, HC; Park, OOk, VACUUM, v.72, no.4, pp.411 - 418, 2004-01 |
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