Adhesion characteristics of UV curable resins for nanoimprint lithography (NIL)

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dc.contributor.authorHeo, J.C.-
dc.contributor.authorKim, K.S.-
dc.contributor.authorKim Kyung-Woong-
dc.date.accessioned2013-03-29T09:15:04Z-
dc.date.available2013-03-29T09:15:04Z-
dc.date.created2012-07-03-
dc.date.issued2010-09-05-
dc.identifier.citationASIATRIB 2010, v., no., pp. --
dc.identifier.urihttp://hdl.handle.net/10203/169681-
dc.languageENG-
dc.titleAdhesion characteristics of UV curable resins for nanoimprint lithography (NIL)-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.publicationnameASIATRIB 2010-
dc.identifier.conferencecountryAustria-
dc.identifier.conferencecountryAustria-
dc.contributor.localauthorKim Kyung-Woong-
dc.contributor.nonIdAuthorHeo, J.C.-
dc.contributor.nonIdAuthorKim, K.S.-
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ME-Conference Papers(학술회의논문)
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