DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Sang Ouk | - |
dc.date.accessioned | 2013-03-29T07:08:51Z | - |
dc.date.available | 2013-03-29T07:08:51Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2010-04-05 | - |
dc.identifier.citation | MRS Spring Meeting, 2010, v., no., pp. - | - |
dc.identifier.uri | http://hdl.handle.net/10203/168920 | - |
dc.language | KOR | - |
dc.publisher | Materials Research Society | - |
dc.title | Block Copolymer Lithography Integrated with Conventional ArF or I-line Lithography | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.publicationname | MRS Spring Meeting, 2010 | - |
dc.identifier.conferencecountry | United States | - |
dc.identifier.conferencecountry | United States | - |
dc.contributor.localauthor | Kim, Sang Ouk | - |
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