High Resolution Bilayer Resists Using Blends of Photoresists and Silicon-Containing Materials
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Woo, Seung A | - |
| dc.contributor.author | Kim, Jin-Baek | - |
| dc.date.accessioned | 2013-03-29T06:33:44Z | - |
| dc.date.available | 2013-03-29T06:33:44Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2011-02-17 | - |
| dc.identifier.citation | 2011 KAIST-Kyoto University Chemistry Symposium, v., no., pp. - | - |
| dc.identifier.uri | http://hdl.handle.net/10203/168681 | - |
| dc.language | ENG | - |
| dc.title | High Resolution Bilayer Resists Using Blends of Photoresists and Silicon-Containing Materials | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | 2011 KAIST-Kyoto University Chemistry Symposium | - |
| dc.identifier.conferencecountry | Japan | - |
| dc.identifier.conferencecountry | Japan | - |
| dc.contributor.localauthor | Kim, Jin-Baek | - |
| dc.contributor.nonIdAuthor | Woo, Seung A | - |
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