Stability and segregation of boron dopants in the interface structure between Si and amorphous SiO2

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Description
물리학과
Publisher
한국물리학회
Issue Date
2011-10
Language
English
Citation

한국물리학회 가을 학술논문발표회 v. no.

URI
http://hdl.handle.net/10203/168633
Appears in Collection
PH-Conference Papers(학술회의논문)
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