DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Sang Ouk | - |
dc.date.accessioned | 2013-03-28T12:56:43Z | - |
dc.date.available | 2013-03-28T12:56:43Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2010-08-17 | - |
dc.identifier.citation | IEEE NANO 2010 Joint Symposium with NANO Korea, v., no., pp. - | - |
dc.identifier.uri | http://hdl.handle.net/10203/165899 | - |
dc.language | KOR | - |
dc.title | Block Copolymer Lithography Integrated with Conventional Photolithography for Functional Nanomaterials | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.publicationname | IEEE NANO 2010 Joint Symposium with NANO Korea | - |
dc.identifier.conferencecountry | South Korea | - |
dc.identifier.conferencecountry | South Korea | - |
dc.contributor.localauthor | Kim, Sang Ouk | - |
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