The noble nano-patterning technology for high resloution pattern(sub 20nm) by secondary sputtering phenomenon over large area
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 전환진 | - |
| dc.contributor.author | 김경환 | - |
| dc.contributor.author | 백연경 | - |
| dc.contributor.author | 김대우 | - |
| dc.contributor.author | 정희태 | - |
| dc.date.accessioned | 2013-03-28T12:07:53Z | - |
| dc.date.available | 2013-03-28T12:07:53Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2010-04-08 | - |
| dc.identifier.citation | 2010 춘계학술대회 한국고분자학회, v., no., pp. - | - |
| dc.identifier.uri | http://hdl.handle.net/10203/165566 | - |
| dc.language | KOR | - |
| dc.publisher | 한국고분자학회 | - |
| dc.title | The noble nano-patterning technology for high resloution pattern(sub 20nm) by secondary sputtering phenomenon over large area | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | 2010 춘계학술대회 한국고분자학회 | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.contributor.localauthor | 정희태 | - |
| dc.contributor.nonIdAuthor | 전환진 | - |
| dc.contributor.nonIdAuthor | 김경환 | - |
| dc.contributor.nonIdAuthor | 백연경 | - |
| dc.contributor.nonIdAuthor | 김대우 | - |
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