Directed Block Copolymer Assembly Integrated with Conventional ArF or I-line lithography
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, Sang Ouk | - |
| dc.date.accessioned | 2013-03-28T11:35:23Z | - |
| dc.date.available | 2013-03-28T11:35:23Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2010-10-20 | - |
| dc.identifier.citation | SEmiconductor MAnufacturing TECHnology (SEMATECH) Directed Self-Assembly Workshop, v., no., pp. - | - |
| dc.identifier.uri | http://hdl.handle.net/10203/165352 | - |
| dc.language | KOR | - |
| dc.title | Directed Block Copolymer Assembly Integrated with Conventional ArF or I-line lithography | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | SEmiconductor MAnufacturing TECHnology (SEMATECH) Directed Self-Assembly Workshop | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.contributor.localauthor | Kim, Sang Ouk | - |
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