Directed Block Copolymer Assembly Integrated with Conventional ArF or I-line lithography

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dc.contributor.authorKim, Sang Ouk-
dc.date.accessioned2013-03-28T11:35:23Z-
dc.date.available2013-03-28T11:35:23Z-
dc.date.created2012-02-06-
dc.date.issued2010-10-20-
dc.identifier.citationSEmiconductor MAnufacturing TECHnology (SEMATECH) Directed Self-Assembly Workshop, v., no., pp. --
dc.identifier.urihttp://hdl.handle.net/10203/165352-
dc.languageKOR-
dc.titleDirected Block Copolymer Assembly Integrated with Conventional ArF or I-line lithography-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.publicationnameSEmiconductor MAnufacturing TECHnology (SEMATECH) Directed Self-Assembly Workshop-
dc.identifier.conferencecountrySouth Korea-
dc.identifier.conferencecountrySouth Korea-
dc.contributor.localauthorKim, Sang Ouk-
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MS-Conference Papers(학술회의논문)
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