LIGHT SCATTERING PATFERNS OF SIMULATED ENGINEERING SURFACES WHEN THE SURFACES HAVE A SINUSOIDAL WAVINESS

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dc.contributor.authorYim, D.Y.ko
dc.contributor.authorKim, Seung-Wooko
dc.date.accessioned2007-10-05T03:26:45Z-
dc.date.available2007-10-05T03:26:45Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued1994-
dc.identifier.citationINTERNATIONAL JOURNAL OF MACHINE TOOLS & MANUFACTURE, v.34, no.1, pp.33 - 41-
dc.identifier.issn0890-6955-
dc.identifier.urihttp://hdl.handle.net/10203/1649-
dc.description.abstractWaviness induced changes in light scattering patterns were numerically analyzed for several simulated engineering surfaces. The analyses were based upon the light scattering theory developed by Beckmann. In order to simplify the analyses, three sinusoidal waveforms of the same frequency but of three different amplitudes were selected as waviness profiles.-
dc.languageEnglish-
dc.language.isoen_USen
dc.publisherElsevier Sci Ltd-
dc.titleLIGHT SCATTERING PATFERNS OF SIMULATED ENGINEERING SURFACES WHEN THE SURFACES HAVE A SINUSOIDAL WAVINESS-
dc.typeArticle-
dc.identifier.wosidA1994MK20000004-
dc.identifier.scopusid2-s2.0-0028254946-
dc.type.rimsART-
dc.citation.volume34-
dc.citation.issue1-
dc.citation.beginningpage33-
dc.citation.endingpage41-
dc.citation.publicationnameINTERNATIONAL JOURNAL OF MACHINE TOOLS & MANUFACTURE-
dc.identifier.doi10.1016/0890-6955(94)90038-8-
dc.embargo.liftdate9999-12-31-
dc.embargo.terms9999-12-31-
dc.contributor.localauthorKim, Seung-Woo-
dc.contributor.nonIdAuthorYim, D.Y.-
dc.type.journalArticleArticle-
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