Wafer admission control for clustered photolithography tools
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Park, Kyung Soo | - |
| dc.contributor.author | Morrison J.R. | - |
| dc.date.accessioned | 2013-03-28T07:44:25Z | - |
| dc.date.available | 2013-03-28T07:44:25Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2010-07-11 | - |
| dc.identifier.citation | 2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2010, v., no., pp.220 - 225 | - |
| dc.identifier.issn | 1078-8743 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/163906 | - |
| dc.language | ENG | - |
| dc.title | Wafer admission control for clustered photolithography tools | - |
| dc.type | Conference | - |
| dc.identifier.scopusid | 2-s2.0-77957567079 | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 220 | - |
| dc.citation.endingpage | 225 | - |
| dc.citation.publicationname | 2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2010 | - |
| dc.identifier.conferencecountry | United States | - |
| dc.contributor.localauthor | Park, Kyung Soo | - |
| dc.contributor.nonIdAuthor | Morrison J.R. | - |
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