Nonchemically amplified resists for deep UV lithography
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Ganesan, Ramakrishnan | ko |
| dc.contributor.author | Kim, Sumin | ko |
| dc.contributor.author | Youn, Seul Ki | ko |
| dc.contributor.author | Cho, Yungook | ko |
| dc.contributor.author | Yun, Jei Moon | ko |
| dc.contributor.author | Kim, Jin-Baek | ko |
| dc.date.accessioned | 2013-03-27T09:26:49Z | - |
| dc.date.available | 2013-03-27T09:26:49Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2007-02-26 | - |
| dc.identifier.citation | Advances in Resist Materials and Processing Technology XXIV | - |
| dc.identifier.issn | 0277-786X | - |
| dc.identifier.uri | http://hdl.handle.net/10203/161268 | - |
| dc.language | English | - |
| dc.publisher | SPIE | - |
| dc.title | Nonchemically amplified resists for deep UV lithography | - |
| dc.type | Conference | - |
| dc.identifier.wosid | 000247395600085 | - |
| dc.identifier.scopusid | 2-s2.0-35148869676 | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | Advances in Resist Materials and Processing Technology XXIV | - |
| dc.identifier.conferencecountry | US | - |
| dc.identifier.conferencelocation | San Jose, CA | - |
| dc.contributor.localauthor | Kim, Jin-Baek | - |
| dc.contributor.nonIdAuthor | Ganesan, Ramakrishnan | - |
| dc.contributor.nonIdAuthor | Kim, Sumin | - |
| dc.contributor.nonIdAuthor | Youn, Seul Ki | - |
| dc.contributor.nonIdAuthor | Cho, Yungook | - |
| dc.contributor.nonIdAuthor | Yun, Jei Moon | - |
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