Two-photon stereo lithography is recognized as a promising process for the fabrication of three-dimensional (3D) microstructures with 100 ㎚ resolution. Generally, beam-scanning system has been used in the conventional process of two-photon stereo lithography, which is limited to the fabrication of micro-prototypes in small area of several tens micrometers. For the applications to 3D high-functional micro-devices, the fabrication area of the process is required to be enlarged. In this paper, large-area two-photon stereo lithography (L-TPS) employing stage scanning system has been developed. Continuous scanning method is suggested to improve the fabrication speed and parameter study is conducted. An objective lens of high numerical aperture (N.A.) and high strength material were employed in this system. Through this work, 3D microstructures of 600*600* 100 ㎛ were fabricated.