A 32nm SoC Platform Technology with 2nd Generation High-k/Metal Gate Transistors Optimized for Ultra Low Power, High Performance, and High Density Product Applications
- Issue Date
- 2009-12-09
- Language
- ENG
- Citation
International Electron Devices Meeting, pp.647 - 650
- Appears in Collection
- EE-Conference Papers(학술회의논문)
- Files in This Item
- There are no files associated with this item.
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