A 32nm SoC Platform Technology with 2nd Generation High-k/Metal Gate Transistors Optimized for Ultra Low Power, High Performance, and High Density Product Applications

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Issue Date
2009-12-09
Language
ENG
Citation

International Electron Devices Meeting, pp.647 - 650

URI
http://hdl.handle.net/10203/158707
Appears in Collection
EE-Conference Papers(학술회의논문)
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