Dielectric properties of SrTiO3 thin films on SrRuO3 seed prepared by plasma-enhanced atomic layer deposition

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dc.contributor.authorAhn J.-H.ko
dc.contributor.authorKim J.-Y.ko
dc.contributor.authorKim J.-H.ko
dc.contributor.authorRoh J.-S.ko
dc.contributor.authorKang S.-W.ko
dc.date.accessioned2013-03-27T01:56:24Z-
dc.date.available2013-03-27T01:56:24Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2008-10-13-
dc.identifier.citationPhysics and Technology of High-k Gate Dielectrics 6 - 214th ECS Meeting, pp.335 - 339-
dc.identifier.issn1938-5862-
dc.identifier.urihttp://hdl.handle.net/10203/158069-
dc.languageEnglish-
dc.publisher123-
dc.titleDielectric properties of SrTiO3 thin films on SrRuO3 seed prepared by plasma-enhanced atomic layer deposition-
dc.typeConference-
dc.identifier.wosid000272592200034-
dc.identifier.scopusid2-s2.0-63149168096-
dc.type.rimsCONF-
dc.citation.beginningpage335-
dc.citation.endingpage339-
dc.citation.publicationnamePhysics and Technology of High-k Gate Dielectrics 6 - 214th ECS Meeting-
dc.identifier.conferencecountryUS-
dc.identifier.conferencelocationHonolulu, HI-
dc.contributor.localauthorKang S.-W.-
dc.contributor.nonIdAuthorAhn J.-H.-
dc.contributor.nonIdAuthorKim J.-Y.-
dc.contributor.nonIdAuthorKim J.-H.-
dc.contributor.nonIdAuthorRoh J.-S.-
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