Atomic layer deposited IrO-TiO thin film resistor for the thermal inkjet printheads
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kwon S.H. | ko |
| dc.contributor.author | Kirn S.W. | ko |
| dc.contributor.author | Jeong S.J. | ko |
| dc.contributor.author | Kim K.H. | ko |
| dc.contributor.author | Kang S.W. | ko |
| dc.date.accessioned | 2013-03-27T01:42:30Z | - |
| dc.date.available | 2013-03-27T01:42:30Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2008-10-13 | - |
| dc.identifier.citation | Atomic Layer Deposition Applications 4 - 214th ECS Meeting, pp.315 - 319 | - |
| dc.identifier.issn | 1938-5862 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/157971 | - |
| dc.language | English | - |
| dc.publisher | 123 | - |
| dc.title | Atomic layer deposited IrO-TiO thin film resistor for the thermal inkjet printheads | - |
| dc.type | Conference | - |
| dc.identifier.wosid | 000272018400032 | - |
| dc.identifier.scopusid | 2-s2.0-63149148820 | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 315 | - |
| dc.citation.endingpage | 319 | - |
| dc.citation.publicationname | Atomic Layer Deposition Applications 4 - 214th ECS Meeting | - |
| dc.identifier.conferencecountry | US | - |
| dc.identifier.conferencelocation | Honolulu, HI | - |
| dc.contributor.localauthor | Jeong S.J. | - |
| dc.contributor.nonIdAuthor | Kwon S.H. | - |
| dc.contributor.nonIdAuthor | Kirn S.W. | - |
| dc.contributor.nonIdAuthor | Kim K.H. | - |
| dc.contributor.nonIdAuthor | Kang S.W. | - |
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