DC Field | Value | Language |
---|---|---|
dc.contributor.author | Yang, Dong-Yol | - |
dc.contributor.author | Lim, T. W. | - |
dc.contributor.author | Son, Y. | - |
dc.contributor.author | Kong, H.J. | - |
dc.contributor.author | Lee, K.S. | - |
dc.contributor.author | Park, S. H. | - |
dc.date.accessioned | 2013-03-26T23:44:21Z | - |
dc.date.available | 2013-03-26T23:44:21Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2007-01-01 | - |
dc.identifier.citation | ASPEN, v., no., pp.486 - 491 | - |
dc.identifier.uri | http://hdl.handle.net/10203/157237 | - |
dc.language | ENG | - |
dc.title | 3D nano/micro manufacturing processes employing two-photon stereolithography for a spatially integrated device | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.beginningpage | 486 | - |
dc.citation.endingpage | 491 | - |
dc.citation.publicationname | ASPEN | - |
dc.identifier.conferencecountry | South Korea | - |
dc.identifier.conferencecountry | South Korea | - |
dc.contributor.localauthor | Yang, Dong-Yol | - |
dc.contributor.nonIdAuthor | Lim, T. W. | - |
dc.contributor.nonIdAuthor | Son, Y. | - |
dc.contributor.nonIdAuthor | Kong, H.J. | - |
dc.contributor.nonIdAuthor | Lee, K.S. | - |
dc.contributor.nonIdAuthor | Park, S. H. | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.