Organic-Inorganic Hybrid Resists Based on Methoxysilane Cross-Linker for Deep UV lithography
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Park, Ji Young | - |
| dc.contributor.author | Kim, Jin-Baek | - |
| dc.date.accessioned | 2013-03-26T01:35:41Z | - |
| dc.date.available | 2013-03-26T01:35:41Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2008-01-28 | - |
| dc.identifier.citation | European Mask and Lithography Conference, v., no., pp.0 - 0 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/156815 | - |
| dc.language | ENG | - |
| dc.title | Organic-Inorganic Hybrid Resists Based on Methoxysilane Cross-Linker for Deep UV lithography | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 0 | - |
| dc.citation.endingpage | 0 | - |
| dc.citation.publicationname | European Mask and Lithography Conference | - |
| dc.identifier.conferencecountry | Germany | - |
| dc.identifier.conferencecountry | Germany | - |
| dc.contributor.localauthor | Kim, Jin-Baek | - |
| dc.contributor.nonIdAuthor | Park, Ji Young | - |
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- CH-Conference Papers(학술회의논문)
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