DC Field | Value | Language |
---|---|---|
dc.contributor.author | Park, J.W. | - |
dc.contributor.author | Jeon, N. | - |
dc.contributor.author | Jang, J. | - |
dc.contributor.author | Han, S.W. | - |
dc.contributor.author | Yoo, Seunghyup | - |
dc.date.accessioned | 2013-03-26T01:05:28Z | - |
dc.date.available | 2013-03-26T01:05:28Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2008-12-03 | - |
dc.identifier.citation | 15th International Display Workshops, IDW '08, v., no., pp.1641 - 1643 | - |
dc.identifier.uri | http://hdl.handle.net/10203/156614 | - |
dc.language | ENG | - |
dc.publisher | International Display Workshops | - |
dc.title | New challenge to oxide TFT backplane technology: Using n-type TiO 2 active channel layers | - |
dc.type | Conference | - |
dc.identifier.scopusid | 2-s2.0-77954106827 | - |
dc.type.rims | CONF | - |
dc.citation.beginningpage | 1641 | - |
dc.citation.endingpage | 1643 | - |
dc.citation.publicationname | 15th International Display Workshops, IDW '08 | - |
dc.identifier.conferencecountry | Japan | - |
dc.identifier.conferencecountry | Japan | - |
dc.contributor.localauthor | Yoo, Seunghyup | - |
dc.contributor.nonIdAuthor | Park, J.W. | - |
dc.contributor.nonIdAuthor | Jeon, N. | - |
dc.contributor.nonIdAuthor | Jang, J. | - |
dc.contributor.nonIdAuthor | Han, S.W. | - |
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