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College of Engineering(공과대학)School of Electrical Engineering(전기및전자공학부)EE-Conference Papers(학술회의논문)

Metal gate technology for fully depleted SOI CMOS

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dc.contributor.authorChoi, Yang-Kyu-
dc.contributor.authorRanade, P-
dc.contributor.authorHa, D-
dc.contributor.authorTakeuchi, H-
dc.contributor.authorKing, TJ-
dc.date.accessioned2013-03-18T19:01:58Z-
dc.date.available2013-03-18T19:01:58Z-
dc.date.created2012-02-06-
dc.date.issued2003-03-
dc.identifier.citation4th International AVS Conference on Microelectronics and Interfaces(ICMI 03), v., no., pp. --
dc.identifier.urihttp://hdl.handle.net/10203/151457-
dc.languageENG-
dc.publisherAVS-
dc.titleMetal gate technology for fully depleted SOI CMOS-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.publicationname4th International AVS Conference on Microelectronics and Interfaces(ICMI 03)-
dc.identifier.conferencecountryUnited States-
dc.identifier.conferencecountryUnited States-
dc.contributor.localauthorChoi, Yang-Kyu-
dc.contributor.nonIdAuthorRanade, P-
dc.contributor.nonIdAuthorHa, D-
dc.contributor.nonIdAuthorTakeuchi, H-
dc.contributor.nonIdAuthorKing, TJ-
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EE-Conference Papers(학술회의논문)
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