Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition of TiO2 Films on Silica Gel Powders in a Circulating Fluidized Bed Reacrtor

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dc.contributor.author김상돈-
dc.date.accessioned2013-03-18T17:52:10Z-
dc.date.available2013-03-18T17:52:10Z-
dc.date.created2012-02-06-
dc.date.issued2006-
dc.identifier.citation한국화학공학회학술회의, v., no., pp.P-FB-10 --
dc.identifier.urihttp://hdl.handle.net/10203/150907-
dc.languageKOR-
dc.titleAtmospheric Pressure Plasma Enhanced Chemical Vapor Deposition of TiO2 Films on Silica Gel Powders in a Circulating Fluidized Bed Reacrtor-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpageP-FB-10-
dc.citation.publicationname한국화학공학회학술회의-
dc.identifier.conferencecountrySouth Korea-
dc.contributor.localauthor김상돈-
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CBE-Conference Papers(학술회의논문)
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