In-situ Control of Oxygen Content and the Effect on PL Intensity of SiOx and SiOx/SiOx Superlattices Grown by Physical Deposition

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dc.contributor.authorKim, Kyungjoong-
dc.contributor.authorMoon, Daewon-
dc.contributor.authorYang, Moonseung-
dc.contributor.authorJhe, Jihong-
dc.contributor.authorShin, JungHoon-
dc.contributor.authorHong, Seunghui-
dc.contributor.authorChoi, Sukho-
dc.date.accessioned2013-03-18T17:12:11Z-
dc.date.available2013-03-18T17:12:11Z-
dc.date.created2012-02-06-
dc.date.issued2003-
dc.identifier.citationMaterials Research Society, v., no., pp. --
dc.identifier.urihttp://hdl.handle.net/10203/150555-
dc.languageENG-
dc.titleIn-situ Control of Oxygen Content and the Effect on PL Intensity of SiOx and SiOx/SiOx Superlattices Grown by Physical Deposition-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.publicationnameMaterials Research Society-
dc.identifier.conferencecountryUnited States-
dc.identifier.conferencecountryUnited States-
dc.contributor.localauthorShin, JungHoon-
dc.contributor.nonIdAuthorKim, Kyungjoong-
dc.contributor.nonIdAuthorMoon, Daewon-
dc.contributor.nonIdAuthorYang, Moonseung-
dc.contributor.nonIdAuthorJhe, Jihong-
dc.contributor.nonIdAuthorHong, Seunghui-
dc.contributor.nonIdAuthorChoi, Sukho-
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