Showing results 1 to 4 of 4
Evaluation of equipment models of clustered photolithography tools for semiconductor fab simulation = 반도체 팹 시뮬레이션을 위한 클러스터 포토리소그래피 장비의 모델 평가link Park, Jung Yeon; 박중연; et al, 한국과학기술원, 2016 |
Exit Recursion Models of Clustered Photolithography Tools for Fab Level Simulation Park, Jung Yeon; Park, Kyungsu; Morrison, James R., IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, v.30, no.1, pp.39 - 51, 2017-02 |
Models of Clustered Photolithography Tools for Fab-Level Simulation: From Affine to Flow Line Park, Jung Yeon; Park, Kyungsu; Morrison, James R., IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, v.30, no.4, pp.547 - 558, 2017-11 |
Multiclass Flow Line Models of Semiconductor Manufacturing Equipment for Fab-Level Simulation Morrison, James R, IEEE TRANSACTIONS ON AUTOMATION SCIENCE AND ENGINEERING, v.8, no.1, pp.81 - 94, 2011-01 |
Discover