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Showing results 1 to 4 of 4

1
Evaluation of equipment models of clustered photolithography tools for semiconductor fab simulation = 반도체 팹 시뮬레이션을 위한 클러스터 포토리소그래피 장비의 모델 평가link

Park, Jung Yeon; 박중연; et al, 한국과학기술원, 2016

2
Exit Recursion Models of Clustered Photolithography Tools for Fab Level Simulation

Park, Jung Yeon; Park, Kyungsu; Morrison, James R., IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, v.30, no.1, pp.39 - 51, 2017-02

3
Models of Clustered Photolithography Tools for Fab-Level Simulation: From Affine to Flow Line

Park, Jung Yeon; Park, Kyungsu; Morrison, James R., IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, v.30, no.4, pp.547 - 558, 2017-11

4
On the Consequences of Un-Modeled Dynamics to the Optimality of Schedules in Clustered Photolithography Tools

Kim, Hyeong-Ook; Park, Se-Hyeon; Park, Jung Yeon; Morrison, James R, 2019 Winter Simulation Conference, WSC 2019, pp.2224 - 2235, Institute of Electrical and Electronics Engineers Inc., 2019-12

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