New Fabrication Technology for 3-D Photoresist Structures and Its Application to Microfluidic Components
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 윤의식 | ko |
| dc.date.accessioned | 2013-03-18T14:59:44Z | - |
| dc.date.available | 2013-03-18T14:59:44Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2004-02 | - |
| dc.identifier.citation | 제11회 반도체 학술대회 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/149498 | - |
| dc.language | Korean | - |
| dc.publisher | 한국 반도체학술대회 | - |
| dc.title | New Fabrication Technology for 3-D Photoresist Structures and Its Application to Microfluidic Components | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | 제11회 반도체 학술대회 | - |
| dc.identifier.conferencecountry | KO | - |
| dc.identifier.conferencelocation | 무주리조트 호텔티롤 | - |
| dc.contributor.localauthor | 윤의식 | - |
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