EEDF measurements in dual frequency capacitively coupled plasma(CCP).
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Jeon, B | - |
| dc.contributor.author | Shon, J | - |
| dc.contributor.author | Chang, Hong-Young | - |
| dc.date.accessioned | 2013-03-18T14:27:31Z | - |
| dc.date.available | 2013-03-18T14:27:31Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2003-06 | - |
| dc.identifier.citation | The 30th IEEE International Conference on Plasma Science , v., no., pp. - | - |
| dc.identifier.uri | http://hdl.handle.net/10203/149282 | - |
| dc.language | ENG | - |
| dc.publisher | IEEE | - |
| dc.title | EEDF measurements in dual frequency capacitively coupled plasma(CCP). | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | The 30th IEEE International Conference on Plasma Science | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.contributor.localauthor | Chang, Hong-Young | - |
| dc.contributor.nonIdAuthor | Jeon, B | - |
| dc.contributor.nonIdAuthor | Shon, J | - |
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