DC Field | Value | Language |
---|---|---|
dc.contributor.author | Jang, SG | - |
dc.contributor.author | Choi, DG | - |
dc.contributor.author | Yu, HK | - |
dc.contributor.author | Yang, Seung-Man | - |
dc.date.accessioned | 2013-03-18T13:53:46Z | - |
dc.date.available | 2013-03-18T13:53:46Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2003-12 | - |
dc.identifier.citation | The 16th symposium on chemical engineering, Daejeon/Chungnam-Kyushu, v., no., pp. - | - |
dc.identifier.uri | http://hdl.handle.net/10203/149021 | - |
dc.language | ENG | - |
dc.title | Block Copolymer Nanopattern using Patterned Self-Assembled Monolayers | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.publicationname | The 16th symposium on chemical engineering, Daejeon/Chungnam-Kyushu | - |
dc.identifier.conferencecountry | South Korea | - |
dc.identifier.conferencecountry | South Korea | - |
dc.contributor.localauthor | Yang, Seung-Man | - |
dc.contributor.nonIdAuthor | Jang, SG | - |
dc.contributor.nonIdAuthor | Choi, DG | - |
dc.contributor.nonIdAuthor | Yu, HK | - |
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