TiO2 Film Deposition on Powder by Plasma Enhanced Chemical Vapor Deposition in a Circulating Fluidized Bed Reactor
- Issue Date
- 2005
- Language
- KOR
- Citation
Symp. on Chem. Eng., pp.122 - 123
- Appears in Collection
- CBE-Conference Papers(학술회의논문)
- Files in This Item
- There are no files associated with this item.
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