DSpace at KOASAS: Multiple-pulse laser annealing of boron-implanted preamorphized silicon and the process optimization

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College of Engineering(공과대학)School of Electrical Engineering(전기및전자공학부)EE-Conference Papers(학술회의논문)

Multiple-pulse laser annealing of boron-implanted preamorphized silicon and the process optimizationMultiple-pulse laser annealing of boron-implanted preamorphized silicon and the process optimization

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Cho, Byung Jin researcher / Poon, D / Tan, LS / Bhat, M / See, A

Issue Date: 2004-03-15

Language: ENG

Citation: IEEE 4th International Workshop on Junction Technology (IWJT-2004), pp.22 - 26

URI: http://hdl.handle.net/10203/146880

Appears in Collection: EE-Conference Papers(학술회의논문)

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Multiple-pulse laser annealing of boron-implanted preamorphized silicon and the process optimizationMultiple-pulse laser annealing of boron-implanted preamorphized silicon and the process optimization

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