Punchthrough Characteristics of CMOS Souble-Gate FinFET

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dc.contributor.authorChoi, Yang-Kyu-
dc.contributor.authorRyu, Seong-Wan-
dc.contributor.authorLee, Hyunjin-
dc.date.accessioned2013-03-18T05:20:10Z-
dc.date.available2013-03-18T05:20:10Z-
dc.date.created2012-02-06-
dc.date.issued2005-02-
dc.identifier.citationThe 12th Korean Conference on Semiconductors (KCS), v., no., pp.97 - 98-
dc.identifier.urihttp://hdl.handle.net/10203/145100-
dc.description.abstractHyunjin-
dc.languageKOR-
dc.titlePunchthrough Characteristics of CMOS Souble-Gate FinFET-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage97-
dc.citation.endingpage98-
dc.citation.publicationnameThe 12th Korean Conference on Semiconductors (KCS)-
dc.identifier.conferencecountrySouth Korea-
dc.identifier.conferencecountrySouth Korea-
dc.contributor.localauthorChoi, Yang-Kyu-
dc.contributor.nonIdAuthorRyu, Seong-Wan-
dc.contributor.nonIdAuthorLee, Hyunjin-
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EE-Conference Papers(학술회의논문)
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