DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Yuna | - |
dc.contributor.author | Kim, Jin-Baek | - |
dc.date.accessioned | 2013-03-18T03:11:23Z | - |
dc.date.available | 2013-03-18T03:11:23Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2004-10 | - |
dc.identifier.citation | 대한화학회 2004년도 추계 학술회의 , v., no., pp.0 - 0 | - |
dc.identifier.uri | http://hdl.handle.net/10203/144199 | - |
dc.language | ENG | - |
dc.publisher | 대한화학회 | - |
dc.title | Main chain scission photoresist for 193-nm lithography | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.beginningpage | 0 | - |
dc.citation.endingpage | 0 | - |
dc.citation.publicationname | 대한화학회 2004년도 추계 학술회의 | - |
dc.identifier.conferencecountry | South Korea | - |
dc.identifier.conferencecountry | South Korea | - |
dc.contributor.localauthor | Kim, Jin-Baek | - |
dc.contributor.nonIdAuthor | Kim, Yuna | - |
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