Silicon oxide deposition by atmospheric-pressure PECVD in a circulating fluidized bed reactor
- Issue Date
- 2003
- Language
- KOR
- Citation
한국화학공학회 2003년 가을 학술대회, pp.2589 - 2589
- Appears in Collection
- CBE-Conference Papers(학술회의논문)
- Files in This Item
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.