DC Field | Value | Language |
---|---|---|
dc.contributor.author | Khim, H. | - |
dc.contributor.author | Park, J. | - |
dc.contributor.author | Kwon, T. | - |
dc.contributor.author | You, J. | - |
dc.contributor.author | Kim, Seung-Woo | - |
dc.date.accessioned | 2013-03-17T05:12:17Z | - |
dc.date.available | 2013-03-17T05:12:17Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2006 | - |
dc.identifier.citation | The 2nd International Conference on Positioning Technology, v., no., pp.141 - 145 | - |
dc.identifier.uri | http://hdl.handle.net/10203/140129 | - |
dc.language | ENG | - |
dc.title | On-machine surface profile metrology for Polishing large-scale Opitcs | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.beginningpage | 141 | - |
dc.citation.endingpage | 145 | - |
dc.citation.publicationname | The 2nd International Conference on Positioning Technology | - |
dc.identifier.conferencecountry | South Korea | - |
dc.identifier.conferencecountry | South Korea | - |
dc.contributor.localauthor | Kim, Seung-Woo | - |
dc.contributor.nonIdAuthor | Khim, H. | - |
dc.contributor.nonIdAuthor | Park, J. | - |
dc.contributor.nonIdAuthor | Kwon, T. | - |
dc.contributor.nonIdAuthor | You, J. | - |
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