Microfabrication of 3-dimensional photoresist structures using selective patterning and development on two types of specific resists and its application to microfluidic components

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dc.contributor.authorYun K.-S.-
dc.contributor.authorYoon E.-
dc.date.accessioned2013-03-17T04:42:26Z-
dc.date.available2013-03-17T04:42:26Z-
dc.date.created2012-02-06-
dc.date.issued2004-01-25-
dc.identifier.citation17th IEEE International Conference on Micro Electro Mechanical Systems (MEMS): Maastricht MEMS 2004 Technical Digest, v., no., pp.757 - 760-
dc.identifier.issn1084-6999-
dc.identifier.urihttp://hdl.handle.net/10203/139925-
dc.languageENG-
dc.titleMicrofabrication of 3-dimensional photoresist structures using selective patterning and development on two types of specific resists and its application to microfluidic components-
dc.typeConference-
dc.identifier.scopusid2-s2.0-3042739420-
dc.type.rimsCONF-
dc.citation.beginningpage757-
dc.citation.endingpage760-
dc.citation.publicationname17th IEEE International Conference on Micro Electro Mechanical Systems (MEMS): Maastricht MEMS 2004 Technical Digest-
dc.contributor.localauthorYoon E.-
dc.contributor.nonIdAuthorYun K.-S.-
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