DC Field | Value | Language |
---|---|---|
dc.contributor.author | Ganesan, Ramakrishnan | ko |
dc.contributor.author | Choi, Jae-Hak | ko |
dc.contributor.author | Kim, Kyoung-Seon | ko |
dc.contributor.author | Oh, Tae-Hwan | ko |
dc.contributor.author | Yun, Hyo-Jin | ko |
dc.contributor.author | Kwon, Young-Gil | ko |
dc.contributor.author | Kim, Jin-Baek | ko |
dc.date.accessioned | 2013-03-17T01:46:24Z | - |
dc.date.available | 2013-03-17T01:46:24Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2005-02-27 | - |
dc.identifier.citation | SPIE-The International Society for Optical Engineering, pp.0 | - |
dc.identifier.uri | http://hdl.handle.net/10203/138509 | - |
dc.language | English | - |
dc.publisher | SPIE | - |
dc.title | Bilayer Resists Based on Polyhedral Oligomeric Silsesquioxane for 193-nm Lithography | - |
dc.type | Conference | - |
dc.identifier.wosid | 000229580700071 | - |
dc.type.rims | CONF | - |
dc.citation.beginningpage | 0 | - |
dc.citation.endingpage | 0 | - |
dc.citation.publicationname | SPIE-The International Society for Optical Engineering | - |
dc.identifier.conferencecountry | KO | - |
dc.contributor.localauthor | Kim, Jin-Baek | - |
dc.contributor.nonIdAuthor | Ganesan, Ramakrishnan | - |
dc.contributor.nonIdAuthor | Choi, Jae-Hak | - |
dc.contributor.nonIdAuthor | Kim, Kyoung-Seon | - |
dc.contributor.nonIdAuthor | Oh, Tae-Hwan | - |
dc.contributor.nonIdAuthor | Yun, Hyo-Jin | - |
dc.contributor.nonIdAuthor | Kwon, Young-Gil | - |
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