Oxidation and Initial Growth Stage of Microcrystalline Si Film Deposited by Photo-CVD and Its Memory Device Application
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Lee, Jeong Yong | - |
| dc.contributor.author | Lim, Koeng Su | - |
| dc.date.accessioned | 2013-03-16T22:56:43Z | - |
| dc.date.available | 2013-03-16T22:56:43Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2000-11-01 | - |
| dc.identifier.citation | Materials Research Society, v., no., pp. - | - |
| dc.identifier.uri | http://hdl.handle.net/10203/136938 | - |
| dc.language | ENG | - |
| dc.title | Oxidation and Initial Growth Stage of Microcrystalline Si Film Deposited by Photo-CVD and Its Memory Device Application | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | Materials Research Society | - |
| dc.contributor.localauthor | Lee, Jeong Yong | - |
| dc.contributor.localauthor | Lim, Koeng Su | - |
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