DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Jin-Baek | - |
dc.contributor.author | Lee, Jae Jun | - |
dc.contributor.author | Lee, Kwan Gu | - |
dc.date.accessioned | 2013-03-16T22:10:24Z | - |
dc.date.available | 2013-03-16T22:10:24Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2000-04 | - |
dc.identifier.citation | 한국고분자학회 2000년 춘계학술대회, v.25, no.1, pp.135 - 135 | - |
dc.identifier.uri | http://hdl.handle.net/10203/136435 | - |
dc.language | ENG | - |
dc.publisher | 한국고분자학회 | - |
dc.title | Chemically amplified silicon-containing cycloaliphatic photoresists: their synthesis and application to 193-nm lithography | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.volume | 25 | - |
dc.citation.issue | 1 | - |
dc.citation.beginningpage | 135 | - |
dc.citation.endingpage | 135 | - |
dc.citation.publicationname | 한국고분자학회 2000년 춘계학술대회 | - |
dc.identifier.conferencecountry | South Korea | - |
dc.identifier.conferencecountry | South Korea | - |
dc.contributor.localauthor | Kim, Jin-Baek | - |
dc.contributor.nonIdAuthor | Lee, Jae Jun | - |
dc.contributor.nonIdAuthor | Lee, Kwan Gu | - |
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