Numerical Analysis of an Inductively Coupled Plasma Process
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, Dong Ho | - |
| dc.contributor.author | Kim, DoHyun | - |
| dc.date.accessioned | 2013-03-16T20:36:21Z | - |
| dc.date.available | 2013-03-16T20:36:21Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1999-10 | - |
| dc.identifier.citation | 12th Intern. Symposium on Chemical Engineering, v., no., pp.153 - 154 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/135568 | - |
| dc.language | ENG | - |
| dc.title | Numerical Analysis of an Inductively Coupled Plasma Process | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 153 | - |
| dc.citation.endingpage | 154 | - |
| dc.citation.publicationname | 12th Intern. Symposium on Chemical Engineering | - |
| dc.contributor.localauthor | Kim, DoHyun | - |
| dc.contributor.nonIdAuthor | Kim, Dong Ho | - |
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