DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Jin-Baek | - |
dc.contributor.author | Kim, Hyun-Woo | - |
dc.date.accessioned | 2013-03-16T17:28:41Z | - |
dc.date.available | 2013-03-16T17:28:41Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1999 | - |
dc.identifier.citation | 한국고분자학회 1999년 춘계 학술대회 , v., no., pp.66 - 66 | - |
dc.identifier.uri | http://hdl.handle.net/10203/133755 | - |
dc.language | ENG | - |
dc.publisher | 한국고분자학회 | - |
dc.title | Lithographic Performance of a Dry-developable Photoresist based on the Methacrylate Polymer with 2-Trimethylsilyl-2-propyl Ester Protecting Group | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.beginningpage | 66 | - |
dc.citation.endingpage | 66 | - |
dc.citation.publicationname | 한국고분자학회 1999년 춘계 학술대회 | - |
dc.identifier.conferencecountry | South Korea | - |
dc.contributor.localauthor | Kim, Jin-Baek | - |
dc.contributor.nonIdAuthor | Kim, Hyun-Woo | - |
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