Easy-axis reorientation with Ar sputtering pressure in Ni/Pd multilayer films
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Jeong, JR | - |
| dc.contributor.author | Shin, Sung-Chul | - |
| dc.date.accessioned | 2013-03-16T15:39:21Z | - |
| dc.date.available | 2013-03-16T15:39:21Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1999 | - |
| dc.identifier.citation | Magnetism and Magnetic Materials Conference, v., no., pp.360 - | - |
| dc.identifier.uri | http://hdl.handle.net/10203/132727 | - |
| dc.language | ENG | - |
| dc.publisher | Magnetism and Magnetic Materials | - |
| dc.title | Easy-axis reorientation with Ar sputtering pressure in Ni/Pd multilayer films | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 360 | - |
| dc.citation.publicationname | Magnetism and Magnetic Materials Conference | - |
| dc.identifier.conferencecountry | United States | - |
| dc.identifier.conferencecountry | United States | - |
| dc.contributor.localauthor | Shin, Sung-Chul | - |
| dc.contributor.nonIdAuthor | Jeong, JR | - |
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